Teachers : Eric Bourillot / Eric Lesniewska / Laurent Markey

Nanofabrication essentially uses two ways to manufacture nano-objects: the bottom-up approach and the top-down approach. We propose to familiarize students with the top-down technique, called lithography, and used in the laboratory. This conventional manufacturing technique uses the interaction of an incident beam (e-beam or UV) with the material. The techniques of UV lithography and e-beam lithography will be presented as well as techniques of scanning electron microscopy (SEM), thin film deposition (PVD) and reactive ion etching (RIE).

Practical works:  PVD + SEM, e-beam lithography, UV lithography, RIE


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